A p-type silicon wafer with acceptor density is illuminated at normal incidence by…
PHYSICS · Multi-part · Fermi University Physics · Condensed Matter, Materials & Soft Matter · Earth, Climate & Energy Physics · Semiconductor physics and devices
Energy from Physics, Ch The illuminated junction: generation, collection and the cell's characteristic
Problem
A p-type silicon wafer with acceptor density NA=1×1015cm−3 is illuminated at normal incidence by monochromatic 800nm light with photon flux Φ0=2×1017cm−2s−1 just inside the front surface (reflection already excluded). At 800nm the absorption length in silicon is 1/α=12μm. The radiative and Auger coefficients of silicon are B=4.7×10−15cm3s−1 and Cp=9.9×10−32cm6s−1, and a defect level in this wafer independently limits the lifetime to τdefect=100μs. A finished cell made from similar material is measured at 300K under 1000Wm−2 to have Jsc=32mAcm−2 and J0=2×10−13Acm−2.
((a)) Find the optical generation rate G at the front surface and at a depth of one absorption length.
((b)) Find the combined minority-carrier lifetime, including the radiative, Auger and defect routes.
((c)) Find the cell's open-circuit voltage, fill factor and efficiency.