An abrupt silicon - junction has its side doped to
PHYSICS · Multi-part · Fermi University Physics · Condensed Matter, Materials & Soft Matter · Semiconductor physics and devices · Semiconductor physics and devices
Solid State Physics, Ch Junctions and devices, finished
Problem
An abrupt silicon p-n junction has its p side doped to NA=3.0×1016cm−3, known from the growth. The n-side doping ND is unknown but of the same order, so neither side's share of the depletion width can be neglected. Measured at T=300K, the depletion capacitance per unit area C at two reverse biases V (with V<0 for reverse bias) gives: V=−1.0V: 1/C2=2.11×1015cm4F−2. V=−3.0V: 1/C2=4.52×1015cm4F−2. Use εs=11.7 for silicon, ε0=8.854×10−14Fcm−1, e=1.602×10−19C, ni=1.0×1010cm−3 and kBT/e=25.85mV.
((a)) Show that 1/C2=eεsε0Neff2(Vbi−V) with Neff=NAND/(NA+ND), use the two data points to extract Neff, and from it find ND.
((b)) Extract the built-in voltage Vbi from the data, and compare it with (kBT/e)ln(NAND/ni2) for the dopings you now have.