Is grown pseudomorphically on GaAs

PHYSICS · Multi-part · Fermi University Physics · Condensed Matter, Materials & Soft Matter · Crystal structure, bonding and diffraction · Semiconductor physics and devices

Solid State Physics, Ch Heterostructures, quantum wells and the two-dimensional electron gas

Problem

In0.1Ga0.9As\mathrm{In_{0.1}Ga_{0.9}As} is grown pseudomorphically on GaAs. The unstrained lattice constants are aInAs=0.6058 nma_{\mathrm{InAs}}=0.6058\,\mathrm{nm} and aGaAs=0.5653 nma_{\mathrm{GaAs}}=0.5653\,\mathrm{nm}. ((a)) Using Vegard's law, find the misfit f=(al−as)/asf=(a_l-a_s)/a_s of the layer on the GaAs substrate. ((b)) Using the single-layer force balance for 60∘60^\circ dislocations, hc=b(1−νcos⁡2α)8π∣f∣(1+ν)cos⁡λ[ln⁡(hc/b)+1],h_c=\frac{b(1-\nu\cos^2\alpha)}{8\pi |f|(1+\nu)\cos\lambda}\left[\ln(h_c/b)+1\right], with b=0.40 nmb=0.40\,\mathrm{nm}, ν=0.31\nu=0.31, α=λ=60∘\alpha=\lambda=60^\circ, solve iteratively for the critical thickness hch_c.

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